| Original language | English |
|---|---|
| Pages (from-to) | 495–500 |
| Journal | ECS Transactions |
| Volume | 52 |
| Issue number | 1 |
| State | Published - 2013 |
An Overview of Recent Advances in Chemical Mechanical Polishing (CMP) of Sapphire Substrates
Yu-nong Zhang, Bin Lin, Zhichao Li
Research output: Contribution to journal › Article