Chemical Mechanical Planarization (CMP) of III-V Materials: Physiochemical properties, behavior and biological impact of pre- and post-CMP nanoparticle slurries

Steven Crawford; Shyam Aravamudhan

Chemical Mechanical Planarization (CMP) of III-V Materials: Physiochemical properties, behavior and biological impact of pre- and post-CMP nanoparticle slurries

Joint School of Nanoscience and Nanoengineering

Research output: Contribution to conference › Paper

Original language	English
State	Published - 2016
Event	8th International Nanotoxicology Congress - Duration: Jan 1 2016 → …

Conference

Conference	8th International Nanotoxicology Congress
Period	01/1/16 → …

Cite this

@conference{13c9d17335d5481da6e1ff2645c3fec4,

title = "Chemical Mechanical Planarization (CMP) of III-V Materials: Physiochemical properties, behavior and biological impact of pre- and post-CMP nanoparticle slurries",

author = "Steven Crawford and Shyam Aravamudhan",

year = "2016",

language = "English",

note = "8th International Nanotoxicology Congress ; Conference date: 01-01-2016",

}