Abstract
The silicon carbide (SiC) waffle-substrate n‑channel Insulated Gate Bipolar Transistor (IGBT) is a vertical IGBT designed to operate at blocking voltages below about 15 kV. At these voltages the drift and anode layers are too thin to allow complete removal of the n+ substrate. Instead, a waffle pattern is etched through the substrate to expose the buried anode layer while preserving the structural integrity of the wafer. Feasibility of this approach is demonstrated by fabricating a 10-kV class n-channel IGBT with a differential specific‑on resistance of 160 mΩ-cm2.
| Original language | English |
|---|---|
| Pages (from-to) | 5683 - 5688 |
| Journal | IEEE Transactions on Electron Devices |
| Volume | 69 |
| Issue number | 10 |
| State | Published - 2022 |