Diamond disc pad conditioning in chemical mechanical planarization (CMP): A surface element method to predict pad surface shape

Zhichao Li, Emmanuel A Baisie, XH Zhang

Research output: Contribution to journal › Article

Cite this

@article{d29d1cd06c8945b8851363684ba99d80,

title = "Diamond disc pad conditioning in chemical mechanical planarization (CMP): A surface element method to predict pad surface shape",

author = "Zhichao Li and Baisie, \{Emmanuel A\} and XH Zhang",

year = "2012",

language = "English",

volume = "36",

pages = "356–363",

journal = "Precision Engineering",

number = "2",

}