| Original language | English |
|---|---|
| Title of host publication | Advances in Chemical Mechanical Planarization (CMP) |
| State | Published - 2016 |
Diamond Disc Pad Conditioning in Chemical Mechanical Polishing
- ZHICHAO LI
- , Emmanuel A Baisie
- , Xiaohong Zhang
- , Qi Zhang
Research output: Chapter in Book/Report/Conference proceeding › Chapter