Gate-assisted high-Q-factor junction varactor

  • J. H. Gau
  • , R. T. Wu
  • , Steven Sang
  • , C. H. Kuo
  • , T. L. Chang
  • , H. H. Chen
  • , Anchor Chen
  • , Joe Ko

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

In this letter, we demonstrate a high-performance gate-assisted junction varactor. The gate plays an important role in the varactor; it can decrease the series resistance and enlarge the junction capacitance of this device. With the assistance of a positive-biased gate, the Q-factor of a varactor with 723 fF capacitance at 2.4 GHz is as high as 108. Its tuning ratio is 30.1% when it is operated in the range of 0.5 to 2.5 V. © 2005 IEEE.
Original languageEnglish
Pages (from-to)682-683
Number of pages2
JournalIEEE Electron Device Letters
Volume26
Issue number9
DOIs
StatePublished - Sep 1 2005

Keywords

  • Q-factor
  • Tuning ratio
  • Varactor

Fingerprint

Dive into the research topics of 'Gate-assisted high-Q-factor junction varactor'. Together they form a unique fingerprint.

Cite this