Integration of epitaxial permalloy on Si (100) through domain matching epitaxy paradigm

Research output: Contribution to journal › Article

Original language	English
Pages (from-to)	5-Jan
Journal	Current Opinion in Solid State and Materials Science, 18, 1–5 (2014).
Volume	18
State	Published - 2014

Cite this

@article{839fd48ee7f345379e50d59a181619c1,

title = "Integration of epitaxial permalloy on Si (100) through domain matching epitaxy paradigm",

author = "Rao, \{S. S\} and Prater, \{J T\} and Fan Wub and S Nori and Dhananjay Kumar and J Narayan",

year = "2014",

language = "English",

volume = "18",

pages = "5--Jan",

journal = "Current Opinion in Solid State and Materials Science, 18, 1–5 (2014).",

}

TY - JOUR

T1 - Integration of epitaxial permalloy on Si (100) through domain matching epitaxy paradigm

AU - Rao, S. S

AU - Prater, J T

AU - Wub, Fan

AU - Nori, S

AU - Kumar, Dhananjay

AU - Narayan, J

PY - 2014

Y1 - 2014

M3 - Article

VL - 18

SP - 5-Jan

JO - Current Opinion in Solid State and Materials Science, 18, 1–5 (2014).

JF - Current Opinion in Solid State and Materials Science, 18, 1–5 (2014).

ER -