Nucleation and growth of Yttria-stabilized zirconia thin films using combustion chemical vapor deposition

Research output: Contribution to journalConference articlepeer-review

Abstract

Liquid fuel combustion chemical vapor deposition technique was successfully used for YSZ thin film processing. The nucleation rates were obtained for the samples processed at different temperatures and total-metal-concentrations in the liquid fuel. An optimum substrate temperature was found for the highest nucleation rate. The nucleation rate was increased with the total-metal-concentration. Structural evolution of the thin film in the early processing stage was studied with regard to the formation of nuclei, crystallites and final crystals on the films. The films were found to be affected by high temperature annealing. The crystals and the thin films were characterized with scanning electron microscopy.
Original languageEnglish
Pages (from-to)509-514
Number of pages6
JournalMaterials Research Society Symposium Proceedings
Volume756
StatePublished - Jul 25 2003
EventSolid State Ionics 2002 - Boston MA, United States
Duration: Dec 2 2002Dec 5 2002

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