TY - JOUR
T1 - Nucleation and growth of Yttria-stabilized zirconia thin films using combustion chemical vapor deposition
AU - Xu, Zhigang
AU - Sankar, Jagannathan
AU - Yarmolenko, Sergey
AU - Wei, Qiuming
PY - 2003/7/25
Y1 - 2003/7/25
N2 - Liquid fuel combustion chemical vapor deposition technique was successfully used for YSZ thin film processing. The nucleation rates were obtained for the samples processed at different temperatures and total-metal-concentrations in the liquid fuel. An optimum substrate temperature was found for the highest nucleation rate. The nucleation rate was increased with the total-metal-concentration. Structural evolution of the thin film in the early processing stage was studied with regard to the formation of nuclei, crystallites and final crystals on the films. The films were found to be affected by high temperature annealing. The crystals and the thin films were characterized with scanning electron microscopy.
AB - Liquid fuel combustion chemical vapor deposition technique was successfully used for YSZ thin film processing. The nucleation rates were obtained for the samples processed at different temperatures and total-metal-concentrations in the liquid fuel. An optimum substrate temperature was found for the highest nucleation rate. The nucleation rate was increased with the total-metal-concentration. Structural evolution of the thin film in the early processing stage was studied with regard to the formation of nuclei, crystallites and final crystals on the films. The films were found to be affected by high temperature annealing. The crystals and the thin films were characterized with scanning electron microscopy.
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M3 - Conference article
SN - 0272-9172
VL - 756
SP - 509
EP - 514
JO - Materials Research Society Symposium Proceedings
JF - Materials Research Society Symposium Proceedings
T2 - Solid State Ionics 2002
Y2 - 2 December 2002 through 5 December 2002
ER -