Optical and Plasmonic Properties of High-Electron-Density Epitaxial and Oxidative Controlled Titanium Nitride Thin Films
- Ikenna Chris-Okoro
- , Sheilah Cherono
- , Wisdom Akande
- , Swapnil Nalawade
- , Mengxin Liu
- , Catalin Martin
- , Valentin Craciun
- , R. Soyoung Kim
- , Johannes Mahl
- , Tanja Cuk
- , Junko Yano
- , Ethan Crumlin
- , J. David Schall
- , Shyam Aravamudhan
- , Maria Diana Mihai
- , Jiongzhi Zheng
- , Lei Zhang
- , Geoffroy Hautier
- , Dhananjay Kumar
- Industrial and systems engineering with North Carolina A&T State University
- North Carolina Agricultural and Technical State University
- Ramapo College of New Jersey
- National Institute for Laser, Plasma and Radiation Physics
- Lawrence Berkeley National Laboratory
- University of Colorado Boulder
- Horia Hulubei National Institute of Physics and Nuclear Engineering
- University Politehnica of Bucharest
- Thayer School of Engineering at Dartmouth
Research output: Contribution to journal › Article › peer-review
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